|
Electrochromic property of tungsten trioxide films prepared by DC magnetron sputtering with oblique angle deposition and thermal oxidation |
|---|---|
| รหัสดีโอไอ | |
| Creator | Chantana AIEMPANAKIT |
| Title | Electrochromic property of tungsten trioxide films prepared by DC magnetron sputtering with oblique angle deposition and thermal oxidation |
| Contributor | Areeya CHANACHAI, Nattaya KANCHAI, Montri AIEMPANAKI, Kamon AIEMPANAKIT |
| Publisher | Metallurgy and Materials Science Research Institute Chulalongkorn University |
| Publication Year | 2564 |
| Journal Title | Journal of Metals, Materials and Minerals |
| Journal Vol. | 31 |
| Journal No. | 2 |
| Page no. | 123-128 |
| Keyword | Magnetron sputtering, WO3 film, OAD, Electrochromic, Thermal oxidation |
| ISSN | 8576149 |
| Abstract | In this work, WO3สthin films were prepared in two steps: First, tungsten (W) films with thickness ofส100-300 nm were deposited by DC magnetron sputtering with oblique angle deposition (OAD)สtechnique at 0_สand 85_. Second, sputtered W films were annealed under air atmosphere at a temperatureสof 500_สand different oxidation times for 1-3 h. The structure of WO3สthin films were examined by X-ray diffraction and field emission scanning electron microscope. In addition, the optical andสelectrochromic properties of the WO3สthin films were measured by a spectrophotometer before and afterสtesting in potassium hydroxide electrolytes. The results showed that the OAD technique can enhance porosity and exert high oxidation in W films. The increase in film thickness and oxidation time indicated that the crystallinity of WO3สfilms increased. The condition of WO3films for OAD at 85_,สthickness of 300สnm, and oxidation time of 1 h showed the best electrochromic property with the highestสoptical modulation and current density. |
