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Effect of Sputtering Power on the Structure of DC MagnetronSputtered Vanadium Nitride Thin Films |
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| รหัสดีโอไอ | |
| Creator | 1. Nirun WITIT-ANUN 2. Adisorn BURANAWONG |
| Title | Effect of Sputtering Power on the Structure of DC MagnetronSputtered Vanadium Nitride Thin Films |
| Publisher | Metallurgy and Materials Science Research Institute, Chulalongkorn University |
| Publication Year | 2560 |
| Journal Title | Journal of Metals, Materials and Minerals |
| Journal Vol. | 27 |
| Journal No. | 1 |
| Page no. | 47-52 |
| Keyword | vanadium nitride, thin films, DC magnetron sputtering, sputtering power |
| ISSN | 8576149 |
| Abstract | Vanadium nitride (VN) thin films were deposited on Si substrates by reactive DC unbalanced magnetron sputtering. Effect of sputtering power on the structure of the as-deposited films was investigated.The crystal structure, thickness, roughness, surface morphology and chemical composition of the films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), field emission scanning electron microscopy (FE-SEM) and energy dispersive X-ray spectroscopy (EDS), respectively. The results showed that the as-deposited VN thin films had fcc structure with (111), (200) and (220) planes, varying with the sputtering power. The crystallite size and lattice constant of films were in the range of 16 49 nm and 4.119 4.147 A, respectively. The film thickness and roughness increased with increasing of the sputtering power, from 275 nm to 830 nm and 3 nm to12 nm, respectively. The as-deposited films compose of vanadium and nitrogen in different ratios, depending on the sputtering power. Cross section analysis by FE-SEMshowed a compact columnar structure. |
