Effects of nitrogen addition on vibrational property of high nitrogen-content GaPN thin films
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Title Effects of nitrogen addition on vibrational property of high nitrogen-content GaPN thin films
Creator Noppadon Toongyai
Contributor Sakuntam Sanorpim, Songphol Kanjanachuchai
Publisher Chulalongkorn University
Publication Year 2558
Keyword Nitrogen, Thin films, ไนโตรเจน, ฟิล์มบาง
Abstract Structural, vibrational and optical properties of GaP1-xNx films with N contents (x) up to 5.4 at% grown on GaP (001) substrates by MOVPE have been investigated by high resolution X-ray diffraction (HRXRD), micro-Raman spectroscopy and micro-photoluminescence (micro-PL). An average N content was verified by HRXRD to be in a range of 0 to 5.4 at%. All the films are under tensile strain. Smooth surface and fairly flat interface were confirmed by atomic force microscopy (AFM) and scanning electron microscopy (SEM), even though the N atoms were incorporated as high as 5.4 at%. Raman spectra showed the N-related vibrational modes (N-VMs) in range of 440 – 520 cm-1, which is the first validation for GaPN at room temperature. We have investigated the N-VMs Raman intensity (IN-VMs) as a function of N content determined by HRXRD (xXRD). The IN-VMs was found to rise for the GaPN films with higher N incorporation. It is also evident that the N content in the GaPN films determined by Raman spectroscopy technique (xRaman) exhibits a linear dependence on the xXRD. Our results demonstrate that the linear dependence of xRaman on the xXRD provides a useful calibration method to determine the N content in dilute GaPN films with the N content up to 5.4 at%. Room temperature bandgap determined by micro-PL is dramatically reduced, when the N content is increased. A huge band gap bowing parameter of GaPN is calculated to be 10 eV.
URL Website cuir.car.chula.ac.th
Chulalongkorn University

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