Modification of optical and structural properties of DC magnetron sputtered tungsten oxide thin films for electrochromic application
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Creator Phasin YAEMSANGUANSAK
Title Modification of optical and structural properties of DC magnetron sputtered tungsten oxide thin films for electrochromic application
Contributor Manas SITTISHOKTRAM, Rungroj TUAYJAROEN, Ekkaphop KETSOMBUN, Tossaporn LERTVANITHPHOL, Chumphon LUANGCHAISRI, Tula JUTAROSAGA
Publisher Metallurgy and Materials Science Research Institute Chulalongkorn University
Publication Year 2562
Journal Title Journal of Metals Materials and Minerals
Journal Vol. 29
Journal No. 2
Page no. 79-86
Keyword Electrochromic, Tungsten oxide, Reactive DC magnetron sputtering
URL Website http://ojs.materialsconnex.com/index.php/jmmm/article/view/465
Website title Modification of optical and structural properties of DC magnetron sputtered tungsten oxide thin films for electrochromic application | Yaemsanguansak | Journal of Metals Materials and Minerals
ISSN 8576149
Abstract The optical properties of tungsten oxide thin films prepared by a reactive DC magnetron sputtering technique were investigated. The influences of O2 flow rates (15 and 18 sccm) and DC sputtering powers (5, 15 and 25 W) on the optical properties of 200 nm-thick tungsten oxide films on indium tin oxide substrates (WO3/ITO/glass) were investigated using UV-visible spectrophotometer. The results indicated that the transmission modulation in visible region between colored state and bleached state of the films increased significantly with decreasing DC sputtering power and increasing O2 flow rate. The results corresponded with the increase of film roughness and density which promoted the intercalation and deintercalation. The diffusion coefficient of the films was extracted from anodic peak current of cyclic voltammogram to determine the charge intercalation across the films. With the deposition power of 5 W and the O2 flow rate of 18 sccm, the films showed the highest transmission modulation and differential optical density in visible region of 23.35% and 0.223, respectively. This information provided an advantage for developing high performance of electrochromic devices.
Metallurgy and Materials Science Research Institute, Chulalongkorn University ​

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