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Antireflective Surface of Nanostructures Fabricated by CF4 Plasma Etching |
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| รหัสดีโอไอ | |
| Creator | 1. Witchaphol SOMRANG 2. Somyod DENCHITCHAROEN 3. Pitak EIAMCHAI 4. Mati HORPRATHUM 5. Chanunthorn CHANANONNAWATHORN |
| Title | Antireflective Surface of Nanostructures Fabricated by CF4 Plasma Etching |
| Publisher | Metallurgy and Materials Science Research Institute, Chulalongkorn University |
| Publication Year | 2560 |
| Journal Title | Journal of Metals, Materials and Minerals |
| Journal Vol. | 27 |
| Journal No. | 1 |
| Page no. | 39-46 |
| Keyword | antireflection, dewetting, plasma etching |
| ISSN | 8576149 |
| Abstract | In this research, the nanostructures surface were fabricated by the CF4 plasma etching process on the SiO2-based substrates for antireflection applications. The nickel films were firstly deposited on thesubstrates by the sputtering system. The prepared Ni layers were then annealed at 500 C for 1 min in order to promote dewetting process to be used as metal masks. During the etching process, CF4 etching condition was performed for 15-60 min. to create the SiO2 nanopillars. After the etching process, the samples were immersed in nitric acid for 5 min. to remove the nickel masks. The SiO2 nanopillars without Ni were investigated for physical morphologies and optical properties by the field-emission scanning electron microscopy (FESEM) and UV-Vis-NIR spectroscopy respectively. The results showed that the etchingconditions greatly affected the sizes and shapes of the nanostructures, as well as improved the antireflection properties of the SiO2 based materials. |
