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Edge beads removal in a photolithography process througha polymer mold |
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| รหัสดีโอไอ | |
| Creator | 1. Stefania Torino 2. Shomnath Bhowmick 3. Mario Iodice, Maurizio Casalino 4. Vitaliano Tufano 5. Danilo Selvaggi 6. Giuseppe Coppola 7. Mariano Gioffr? |
| Title | Edge beads removal in a photolithography process througha polymer mold |
| Publisher | Research and Development Office, Prince of Songkla University |
| Publication Year | 2564 |
| Journal Title | Songklanakarin Journal of Science and Technology (SJST) |
| Journal Vol. | 43 |
| Journal No. | 2 |
| Page no. | 485-491 |
| Keyword | photolithography, soft lithography, edge bead remover, photoresist |
| URL Website | https://rdo.psu.ac.th/sjstweb/index.php |
| ISSN | 0125-3395 |
| Abstract | In this paper, a new approach for achieving a higher uniformity while spinning photoresist is presented. The proposedmethod allows to overcome the well-known problem of the edge beads formation, which shows either with circular, small orirregular samples. The method consists in the fabrication of an elastomeric mold for housing the substrate, to obtain an equivalentuniformly planar and round surface. After the spin-coating, it is possible to pull out the coated sample from the mold and use it ina standard optical lithography process as well in any technological process. Moreover, the mold can be reused if the samplerequires different lithographic processes. |
